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Analytic height correlation function of rough surfaces derived from light scattering

机译:粗糙面的解析高度相关函数   光散射

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摘要

We derive an analytic expression for the height correlation function of arough surface based on the inverse wave scattering method of Kirchhoff theory.The expression directly relates the height correlation function to diffusescattered intensity along a linear path at fixed polar angle. We test thesolution by measuring the angular distribution of light scattered from roughsilicon surfaces, and comparing extracted height correlation functions to thosederived from atomic force microscopy (AFM). The results agree closely with AFMover a wider range of roughness parameters than previous formulations of theinverse scattering problem, while relying less on large-angle scatter data. Ourexpression thus provides an accurate analytical equation for the heightcorrelation function of a wide range of surfaces based on measurements using asimple, fast experimental procedure.
机译:基于基尔霍夫理论的逆波散射方法,推导了粗糙表面高度相关函数的解析表达式,该表达式将高度相关函数与固定极角处沿线性路径的散射强度直接相关。我们通过测量从粗糙硅表面散射的光的角度分布,并将提取的高度相关函数与原子力显微镜(AFM)得出的高度相关函数进行比较,来测试该解决方案。与先前的反散射问题公式相比,该结果与AFM在更宽范围的粗糙度参数上非常吻合,而对大角度散射数据的依赖则更少。因此,基于使用简单,快速的实验程序进行的测量,ourexpression为各种表面的高度相关函数提供了精确的解析方程。

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